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Titanium Sputtering Target Ti For Plating

  • Titanium Sputtering Target Ti For Plating
Place of Origin China
Brand Name Changsheng
Certification ISO 9001;2015
Model Number ASTM
Minimum Order Quantity 10pc
Price 15usd/kg
Packaging Details packed with export wooden case
Delivery Time 10-15days
Payment Terms L/C, D/A, D/P, T/T, Western Union, MoneyGram
Supply Ability 5000T/MONTH

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Product Details
Materials Titanium Grade Grade 1, Grade 2, Grade 5, Grade 7
OD 10-914mm Thickness 10-600mm
Technical Forge, Rolling, CNC Surface Polished, Anodizing
High Light

Polished Titanium Sputtering Target

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Plating Titanium Sputtering Target

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Titanium Metal Sputtering Target
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Product Description

Description for Titanium Sputtering Target

Titanium Sputtering Target, Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, Titanium is lustrous and silvery-white in appearance. Titanium has a melting point of 1660°C, a density of 4.5 g/cc, and a vapor pressure of 10-4 Torr at 1,453°C. It is a sturdy material and can be easily fabricated when heated. Its strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry. Titanium is a biocompatible material and therefore it has been used in surgical tools and medical implants. Titanium Sputtering Target is generally evaporated in vacuum and deposited as coatings for the purposes of wear and decorative, semiconductor, and optical applications.

 

Physical Properties for Titanium Sputtering Target

 

Grade Tensile stength MPA-Min Yield strength MPA-Min Elongation %-Min
Gr1 240 170 24
Gr2 345 275 20
Gr3 450 380 18
Gr4 550 483 15
Gr5 895 828 10
Gr7 400 275 18
Gr9 620 483 15
Gr12 483 348 18
Gr23/ Gr5-Eli 793 759 10

 

Chemical Composition for Titanium Sputtering Target

Grade

Fe

Max

O

Max

N

Max

C

Max

H

Max

 Pd Max

Al

Max

 Va Max

Ni

Max

 Mo Max
/ Wt % Wt % Wt % Wt % Wt % Wt % Wt % Wt % Wt % Wt %
Gr1 0.2 0.18 0.03 0.08 0.015          
Gr2 0.3 0.25 0.03 0.08 0.015          
Gr3 0.3 0.35 0.05 0.08 0.015          
Gr4 0.5 0.4 0.05 0.08 0.015          
Gr5 0.4 0.2 0.05 0.08 0.015   5.5-6.7 3.5-4.5    
Gr7 0.3 0.25 0.03 0.08 0.015 0.12- 0.25        
Gr9 0.25 0.15 0.03 0.08 0.015   2.5-3.5 2.0-3.0    
Gr12 0.3 0.25 0.03 0.08 0.015       0.6-0.9 0.2-0.4
Gr5eli/Gr23 0.25 0.03 0.03 0.08 0.0125   5.5-6.5 3.5-4.5    
Ti Balanc

Picture showing for Titanium Sputtering Target

Titanium Sputtering Target Ti For Plating 0

 

Titanium Sputtering Targets ( Ti target )


Material: High purity (99.5%, 99.995%), Titanium Sputtering Target

Grade: grade 1, grade 2, grade 5/Ti6Al4V, grade 7 Titanium Sputtering Target
Standard: ASTM B381, ASTM B265, ASTM F67, ASTM F136
Shape: Discs , Rectangle Titanium Sputtering Target
Application: Deposited film nitride as Decorate thin film, Deposited film oxidized to TiO2 as beam splitter or insulator

 

Tags:

Round Niobium Sputtering Target

Aluminum Niobium Sputtering Target

PVD Coating Evaporation Metal Sputtering Target