PVD Metal Sputtering Target 100x40mm Decoration And Tool Coating

Place of Origin CHINA
Brand Name CSTY
Certification GB/T19001-2016/ISO9001:2015
Model Number Gr.1 Zr
Minimum Order Quantity 100pcs
Price $26.00 - $58.00/ Piece
Packaging Details wooden case,carton Packaging can be according to customer requirements.
Delivery Time 15~20 work days
Payment Terms L/C, T/T, Western Union, MoneyGram,Paypal
Supply Ability 100000 pieces per Month

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Product Details
Grain Size <100um Type Sputtering Target
Technical Rolling, Forged, CNC Materials Titanium
Material Metal Composition Customized
Target Configuration Single Or Multiple Grade Grade 1
Crystal Structure Customized Sputtering Method DC Or RF
Target Bonding Indium, Elastomer, Or Sputtering Targets Target Backing Copper, Ti-Al, Titanium, Customized
Application Thin Film Deposition Melting Point Varies Depending On The Metal
Company Advantage High Efficiency, High Presicion
Highlight

Tool Coating Metal Sputtering Target

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100x40mm Metal Sputtering Target

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Decoration Metal Sputtering Target

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Product Description

Description

 

Titanium Sputtering Target — Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, titanium is lustrous and silvery-white in appearance. It has a melting point of 1660°C, a density of 4.5 g/cc, and a vapor pressure of 10⁻⁴ Torr at 1,453°C. It is a sturdy material that can be easily fabricated when heated.
With strong, lightweight characteristics and excellent corrosion resistance, titanium is ideal for ocean liner hulls, aircraft engines, and designer jewelry. As a biocompatible material, it is widely used in surgical tools and medical implants.
Titanium Sputtering Targets are generally evaporated in a vacuum and deposited as coatings for wear resistance, decorative, semiconductor, and optical applications.

Titanium Sputtering Targets (Ti Target)

Material: High purity (99.5%, 99.995%) Titanium Sputtering Target

Grade: Gr1, Gr2, Gr5/Ti6Al4V, Gr7 Titanium Sputtering Target

Standard: ASTM B381, ASTM B265, ASTM F67, ASTM F136

Shape: Discs, Rectangles, Custom Shapes Available

Application: Deposited film nitride as decorative thin film; deposited film oxidized to TiO₂ as beam splitter or insulator

Physical Properties

Grade Tensile Strength (MPa-Min) Yield Strength (MPa-Min) Elongation (%)
Gr1 240 170 24
Gr2 345 275 20
Gr3 450 380 18
Gr4 550 483 15
Gr5 895 828 10
Gr7 400 275 18
Gr9 620 483 15
Gr12 483 348 18
Gr23/Gr5-Eli 793 759 10

Chemical Composition

Grade Fe Max O Max N Max C Max H Max Pd Max Al Max Va Max Ni Max Mo Max
Gr1 0.2 0.18 0.03 0.08 0.015 - - - - -
Gr2 0.3 0.25 0.03 0.08 0.015 - - - - -
Gr3 0.3 0.35 0.05 0.08 0.015 - - - - -
Gr4 0.5 0.4 0.05 0.08 0.015 - - - - -
Gr5 0.4 0.2 0.05 0.08 0.015 - 5.5–6.7 3.5–4.5 - -
Gr7 0.3 0.25 0.03 0.08 0.015 0.12–0.25 - - - -
Gr9 0.25 0.15 0.03 0.08 0.015 - 2.5–3.5 2.0–3.0 - -
Gr12 0.3 0.25 0.03 0.08 0.015 - 0.6–0.9 0.2–0.4 - -
Gr5Eli/Gr23 0.25 0.03 0.03 0.08 0.0125 - 5.5–6.5 3.5–4.5 - -

Ti: Balance

Application

Titanium Targets
Used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. It is a core material in integrated circuit production and usually requires >99.99% purity.

Aluminum Targets
Common in semiconductor and heat-resistant coating applications, also used in vehicles and electronics.

Copper Targets
Ideal for electrical conductivity applications such as electrodes, wiring, and films.

Tin Targets
Applied to enhance corrosion resistance of coated materials.

Zinc Targets
Used as corrosion barriers and in the production of cathodes, batteries, and paints.

Platinum, Silver, and Gold Targets
Precious metal sputtering targets offer chemical inertness and high conductivity for instrument and electrode applications.