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xCoating Method | Sputtering | Technique | Forged And CNC Machined |
---|---|---|---|
Target Configuration | Single Or Multiple | Material | Metal |
Density | Customized | Surface Roughness | Ra < 0.8 Um |
Shape | Round | Thickness | 10-600mm |
Highlight | Single Configuration Metal Sputtering Target,Multiple Configuration Metal Sputtering Target,Customized Metal Sputtering Target |
Product Description:
The Metal Sputtering Target is bonded using indium, which results in a strong and durable bond. This bond makes it possible to achieve high deposition rates and uniform film thicknesses, which are essential for the production of high-quality thin films. The target has a purity of 99.99%, which ensures that the films produced are of the highest quality.
The Metal Sputtering Target is compatible with a wide range of substrates, and can be customized to meet the specific requirements of your application. This makes it an ideal choice for a variety of applications, including the deposition of thin films on carbon steel I beams, H beam steel, and other substrates.
The Metal Sputtering Target has a customized density, which makes it possible to achieve excellent adhesion and film quality. The high density of the target also ensures that it has a long lifespan, which reduces the need for frequent replacements and maintenance.
Whether you are working in the semiconductor industry, thin film industry, or any other industry that requires high-quality sputtering targets, our Metal Sputtering Target is the perfect choice. It is a reliable, durable, and efficient product that will help you achieve your production goals and meet your customers' needs.
Features:
- Product Name: Metal Sputtering Target
- Surface Roughness: Ra < 0.8 Um
- Material: Metal
- Shape: Round
- Target Bonding: Indium
- Crystal Structure: Customized
Use the Metal Sputtering Target product for applications such as:
- Electrostatic Powder Coating Gun
- Industrial Metal Detector Conveyor
- Hand Held Metal Detector
Technical Parameters:
Technical Parameter | Value |
---|---|
Material | Alloy Steel Metal |
Thickness | 10-600mm |
Density | Customized |
Purity | 99.99% |
Target Configuration | Single or Multiple |
Crystal Structure | Customized |
Surface Roughness | Ra < 0.8 Um |
Shape | Round |
Target Bonding | Indium |
Technique | Forged and CNC Machined |
Surface | Polished, Anodizing |
Applications:
The Metal Sputtering Target is compatible with a wide range of substrates, including Carbon Steel I Beam, Alloy Steel Metal, and other similar materials. This makes it a versatile product that can be used in a variety of industrial applications. It has a purity level of 99.99%, which ensures that the thin films produced are of high quality and have consistent properties.
The Metal Sputtering Target is bonded with Indium, which ensures a strong adhesion to the substrate during the sputtering process. This makes it an ideal product for use in applications where a reliable and stable deposition process is required.
The Metal Sputtering Target is widely used in the semiconductor industry for the production of thin films on silicon wafers. It is also used in the production of solar cells, flat panel displays, and other electronic devices. In addition, it is used in the aerospace industry for the production of advanced materials that are used in aircraft components.
The Metal Sputtering Target can also be used in the medical industry for the production of thin films that are used in medical devices. It is also used in the automotive industry for the production of coatings that protect the surface of automotive parts from corrosion and wear.
In summary, the Metal Sputtering Target is a highly versatile product that can be used in a wide range of industrial applications. Its polished surface finish, customizable crystal structure, substrate compatibility, high purity level, and Indium bonding make it an ideal product for use in the semiconductor, aerospace, medical, and automotive industries.
Customization:
Our Metal Sputtering Target can be customized to meet your specific needs. We offer a variety of customization services, including:
- Target Configuration: Single or Multiple targets can be configured to meet your requirements.
- Material: Our targets are made of high-quality metal materials.
- Target Bonding: Indium bonding is available for optimal performance.
- Technique: Our targets are forged and CNC machined for precision and durability.
- Crystal Structure: Customized crystal structures are available to meet your specific application needs.
Additionally, we offer 3D printing metal powder, industrial metal detector conveyor, and conveyor metal detector machine services to further customize your product.
Support and Services:
The Metal Sputtering Target product technical support and services include:
- Expert consultation on target selection and customization for specific applications
- Assistance with target installation and maintenance
- Detailed product specifications and performance data
- Technical troubleshooting and problem-solving
- Customized target bonding services
- Training and education on sputtering processes and equipment
- Product warranty and repair services