Titanium Sputtering Target Ti For Plating Ti Ti-Al Zr Cr for PVD coating

Place of Origin China
Brand Name Changsheng
Certification ISO 9001;2015
Model Number ASTM
Minimum Order Quantity 50pcs
Price 23usd/pc
Packaging Details film and wooden case,carton Packaging can be according to customer requirements.
Delivery Time 10-15days
Payment Terms L/C, D/A, D/P, T/T, Western Union, MoneyGram
Supply Ability 1000 pieces per Month

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Product Details
Materials Titanium Grade Grade 1, Grade 2, Grade 5, Grade 7
OD 10-914mm Thickness 10-600mm
Technical Forge, Rolling, CNC Surface Polished, Anodizing
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Polished Titanium Sputtering Target

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Plating Titanium Sputtering Target

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Titanium Metal Sputtering Target

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Product Description

Description

 

Titanium Sputtering Targets are high-purity titanium materials used in physical vapor deposition (PVD) and magnetron sputtering processes.
Titanium is a lustrous, silvery-white metal known for its high strength-to-weight ratio, low density (4.5 g/cm³), and excellent corrosion resistance.
It has a melting point of 1660°C and a vapour pressure of 10⁻⁴ Torr at 1,453°C, making it ideal for high-temperature and high-vacuum coating applications.

Titanium’s mechanical strength, biocompatibility, and corrosion resistance make it widely used in industries such as semiconductors, aerospace, medical devices, and decorative coatings.
When sputtered, titanium films can be oxidised into TiO₂, forming coatings for optical, insulating, or decorative purposes.

Product Details

Material: High Purity Titanium (99.5%, 99.995%)
Grades: Grade 1, Grade 2, Grade 5 (Ti-6Al-4V), Grade 7
Standards: ASTM B381, ASTM B265, ASTM F67, ASTM F136
Shapes Available: Discs, Rectangles, Custom Sizes
Applications: Decorative thin films, optical coatings, semiconductor layers, and corrosion-resistant coatings

Chemical Composition (%)

Grade Fe (max) O (max) N (max) C (max) H (max) Pd (max) Al V Ni (max) Mo (max) Ti
Gr1 0.20 0.18 0.03 0.08 0.015 Balance
Gr2 0.30 0.25 0.03 0.08 0.015 Balance
Gr3 0.30 0.35 0.05 0.08 0.015 Balance
Gr4 0.50 0.40 0.05 0.08 0.015 Balance
Gr5 0.40 0.20 0.05 0.08 0.015 5.5–6.7 3.5–4.5 Balance
Gr7 0.30 0.25 0.03 0.08 0.015 0.12–0.25 Balance
Gr9 0.25 0.15 0.03 0.08 0.015 2.5–3.5 2.0–3.0 Balance
Gr12 0.30 0.25 0.03 0.08 0.015 0.6–0.9 0.2–0.4 Balance
Gr5-ELI / Gr23 0.25 0.13 0.03 0.08 0.0125 5.5–6.5 3.5–4.5 Balance

Physical Properties

Grade Tensile Strength (MPa, min) Yield Strength (MPa, min) Elongation (%)
Gr1 240 170 24
Gr2 345 275 20
Gr3 450 380 18
Gr4 550 483 15
Gr5 895 828 10
Gr7 400 275 18
Gr9 620 483 15
Gr12 483 348 18
Gr23 / Gr5-ELI 793 759 10

Applications

Titanium sputtering targets are widely used across various industries for both functional and decorative thin-film coatings, including:

  1. Semiconductor and Electronics Industry – Integrated circuits, memory devices, and microelectromechanical systems (MEMS)

  2. Optical Coatings – TiO₂ thin films for beam splitters, mirrors, and anti-reflection coatings

  3. Decorative Coatings – Watches, jewellery, and consumer electronics

  4. Aerospace and Automotive – Protective and heat-resistant coatings

  5. Biomedical Industry – Biocompatible layers for implants and surgical instruments

  6. Solar and Energy Devices – Photocatalytic and conductive coatings

Related Sputtering Target Materials

Aluminium (Al) Targets: For semiconductor and thermal applications

Copper (Cu) Targets: For electrical and conductive coatings

Tin (Sn) Targets: For corrosion-resistant coatings

Zinc (Zn) Targets: For cathodic protection and battery components

Precious Metal Targets (Au, Ag, Pt): For high-conductivity and inert coating layers

Key Features

High purity up to 99.995%

Excellent adhesion and uniform film formation

Corrosion-resistant and thermally stable

Available in various grades and geometries

Complies with ASTM B381 / B265 / F67 / F136 standards