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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation

  • Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
  • Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
  • Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
  • Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
Place of Origin China
Brand Name CSTI
Certification ISO9001
Model Number 20221010
Minimum Order Quantity 1piece
Price $35.00 - $125.00/ kg
Packaging Details Vacuum sealed package inside; export wooden case or carton outside
Delivery Time 7~20 work days
Payment Terms T/T, L/C
Supply Ability 10000 Piece/Pieces per Month

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Product Details
Material Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum Shape Cylinder/planar,Round/plate/tube
Size Round:Φ100*40, Φ98*40,Φ95*45,Φ90*40, Φ85*35, Φ65*40 Etc(D)70/100*(H)100-2000mm Purity 2N5-5N
Application PVD Coating,electroplating Field,Thin Film Coating,Glass Industry Coating Color Rose Gold/coffee/champagne Gold/gun Grey/black/gold/blue/rainbow/light Black/silver/white
High Light

PVD Coating Evaporation Metal Sputtering Target

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Round Niobium Sputtering Target

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Aluminum Niobium Sputtering Target
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Product Description

Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation

Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum.

Item Purity Density Coating color Shape Standard size  
Titanium Aluminum(TiAl) Alloy target 2N8-4N 3.6-4.2 Rose gold/coffee/champagne gold cylinder/planar (D)70/100*(H)100-2000mm

PVD decorative coating

&hard coating
Pure chrome (Cr)target 2N7-4N 7.19 gun grey/black cylinder/planar (D)70/100*(H)100-2000mm
Pure Titanium(Ti) target 2N8-4N 4.51 gold/rose gold/blue/rainbow/light black/gun grey cylinder/planar (D)70/100*(H)100-2000mm
Pure Zirconium(Zr) target 2N5-4N 6.5 light gold cylinder/planar (D)70/100*(H)100-2000mm
Pure Aluminium(Al) target 4N-5N 2.7 silver cylinder/planar (D)70/100*(H)100-2000mm
Pure Nickel (Ni) target 3N-4N 8.9 nickel cylinder/planar (D)70/100*(H)100-2000mm
Pure Niobium (Nb) target 3N 8.57 white cylinder/planar (D)70/100*(H)100-2000mm
Pure Tantalum(Ta) target 3N5 16.4 black/pure cylinder/planar (D)70/100*(H)100-2000mm
Pure Molybdenum (Mo) target 3N5 10.2 black cylinder/planar (D)70/100*(H)100-2000mm
Remarks: Size can be customizaed according to specical requirements

 

Application Field
 
Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition(PVD)
Used for optics including wear protection, decorative coatings, and displays

Product Advantage 

01 High chemical purity

02 Low gas content

03 Close to 100% density

04 Uniform grains

05 Dense and homogeneous inner structure

Metal sputtering targets used in various physical vapor deposition (PVD) and evaporation coating applications

including the deposition of thin films onto a variety of substrates. Here are some details about the specific metals:

1.Titanium: Titanium sputtering targets are commonly used in PVD and evaporation coating applications to deposit thin films onto a range of substrates. Titanium is a popular material for use in coatings because it is both biocompatible and has excellent mechanical properties

2.Aluminum: Aluminum sputtering targets are also used in PVD and evaporation coating applications, especially in the production of reflective coatings and electronic components. Aluminum coatings have good electrical conductivity and are highly reflective, making them ideal for use in optical and electronic applications.

3.Chrome: Chrome sputtering targets are used in PVD and evaporation coating applications for a range of industrial and decorative purposes, including the production of decorative coatings, automotive components, and electronic components.

4.Zirconium: Zirconium sputtering targets are commonly used in PVD and evaporation coating applications for their high melting point and excellent resistance to corrosion. Zirconium coatings are commonly used in the production of decorative coatings and high-performance electronic components.

5.Nickel: Nickel sputtering targets are widely used in PVD and evaporation coating applications, especially in the production of magnetic thin films and coatings for electronic components. Nickel coatings are also commonly used in decorative applications.

6.Niobium: Niobium sputtering targets are used in PVD and evaporation coating applications for their high melting point, low coefficient of thermal expansion, and excellent chemical resistance. Niobium coatings are commonly used in the production of high-performance electronic components and optical coatings.

7.Tantalum: Tantalum sputtering targets are used in PVD and evaporation coating applications for their high melting point, excellent chemical resistance, and low vapor pressure. Tantalum coatings are commonly used in the production of capacitors, electronic components, and medical implants.

8.Molybdenum: Molybdenum sputtering targets are used in PVD and evaporation coating applications for their high melting point, low coefficient of thermal expansion, and excellent electrical conductivity. Molybdenum coatings are commonly used in the production of high-performance electronic components and optical coatings.

 

Tag:   Titanium target for Evaporation Coating,semiconductor,CVD,PVD,decorative coating

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Round Niobium Sputtering Target

Aluminum Niobium Sputtering Target

PVD Coating Evaporation Metal Sputtering Target