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Titanium Pipe Fittings
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Titanium Alloy Sheet
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Titanium Welding Wire
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Titanium Round Bar
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Titanium Clad Copper
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Metal Sputtering Target
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Zirconium Products
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Sintered Porous Filter
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Shape Memory Nitinol Wire
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Niobium Products
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
Place of Origin | China |
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Brand Name | CSTI |
Certification | ISO9001 |
Model Number | 20221010 |
Minimum Order Quantity | 1piece |
Price | $35.00 - $125.00/ kg |
Packaging Details | Vacuum sealed package inside; export wooden case or carton outside |
Delivery Time | 7~20 work days |
Payment Terms | T/T, L/C |
Supply Ability | 10000 Piece/Pieces per Month |

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xMaterial | Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum | Shape | Cylinder/planar,Round/plate/tube |
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Size | Round:Φ100*40, Φ98*40,Φ95*45,Φ90*40, Φ85*35, Φ65*40 Etc(D)70/100*(H)100-2000mm | Purity | 2N5-5N |
Application | PVD Coating,electroplating Field,Thin Film Coating,Glass Industry | Coating Color | Rose Gold/coffee/champagne Gold/gun Grey/black/gold/blue/rainbow/light Black/silver/white |
Highlight | PVD Coating Evaporation Metal Sputtering Target,Round Niobium Sputtering Target,Aluminum Niobium Sputtering Target |
Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation
Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum.
Item | Purity | Density | Coating color | Shape | Standard size | |
Titanium Aluminum(TiAl) Alloy target | 2N8-4N | 3.6-4.2 | Rose gold/coffee/champagne gold | cylinder/planar | (D)70/100*(H)100-2000mm |
PVD decorative coating &hard coating |
Pure chrome (Cr)target | 2N7-4N | 7.19 | gun grey/black | cylinder/planar | (D)70/100*(H)100-2000mm | |
Pure Titanium(Ti) target | 2N8-4N | 4.51 | gold/rose gold/blue/rainbow/light black/gun grey | cylinder/planar | (D)70/100*(H)100-2000mm | |
Pure Zirconium(Zr) target | 2N5-4N | 6.5 | light gold | cylinder/planar | (D)70/100*(H)100-2000mm | |
Pure Aluminium(Al) target | 4N-5N | 2.7 | silver | cylinder/planar | (D)70/100*(H)100-2000mm | |
Pure Nickel (Ni) target | 3N-4N | 8.9 | nickel | cylinder/planar | (D)70/100*(H)100-2000mm | |
Pure Niobium (Nb) target | 3N | 8.57 | white | cylinder/planar | (D)70/100*(H)100-2000mm | |
Pure Tantalum(Ta) target | 3N5 | 16.4 | black/pure | cylinder/planar | (D)70/100*(H)100-2000mm | |
Pure Molybdenum (Mo) target | 3N5 | 10.2 | black | cylinder/planar | (D)70/100*(H)100-2000mm | |
Remarks: Size can be customizaed according to specical requirements |
Product Advantage
01 High chemical purity
02 Low gas content
03 Close to 100% density
04 Uniform grains
05 Dense and homogeneous inner structure
including the deposition of thin films onto a variety of substrates. Here are some details about the specific metals:
1.Titanium: Titanium sputtering targets are commonly used in PVD and evaporation coating applications to deposit thin films onto a range of substrates. Titanium is a popular material for use in coatings because it is both biocompatible and has excellent mechanical properties
2.Aluminum: Aluminum sputtering targets are also used in PVD and evaporation coating applications, especially in the production of reflective coatings and electronic components. Aluminum coatings have good electrical conductivity and are highly reflective, making them ideal for use in optical and electronic applications.
3.Chrome: Chrome sputtering targets are used in PVD and evaporation coating applications for a range of industrial and decorative purposes, including the production of decorative coatings, automotive components, and electronic components.
4.Zirconium: Zirconium sputtering targets are commonly used in PVD and evaporation coating applications for their high melting point and excellent resistance to corrosion. Zirconium coatings are commonly used in the production of decorative coatings and high-performance electronic components.
5.Nickel: Nickel sputtering targets are widely used in PVD and evaporation coating applications, especially in the production of magnetic thin films and coatings for electronic components. Nickel coatings are also commonly used in decorative applications.
6.Niobium: Niobium sputtering targets are used in PVD and evaporation coating applications for their high melting point, low coefficient of thermal expansion, and excellent chemical resistance. Niobium coatings are commonly used in the production of high-performance electronic components and optical coatings.
7.Tantalum: Tantalum sputtering targets are used in PVD and evaporation coating applications for their high melting point, excellent chemical resistance, and low vapor pressure. Tantalum coatings are commonly used in the production of capacitors, electronic components, and medical implants.
8.Molybdenum: Molybdenum sputtering targets are used in PVD and evaporation coating applications for their high melting point, low coefficient of thermal expansion, and excellent electrical conductivity. Molybdenum coatings are commonly used in the production of high-performance electronic components and optical coatings.